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Ce1−xNdxO2−δ/Si thin films obtained by pulsed laser deposition: Microstructure and conduction properties

M. Chmielowska 1 Sylvie Villain 2 A. Kopia J. Dallas J. Kusinski 3 Jean-Raymond Gavarri Christine Leroux 2 
1 CRHEA - Centre de recherche sur l'hétéroepitaxie et ses applications
2 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
3 AGH UST - AGH University of Science and Technology [Krakow, PL]
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https://hal-univ-tln.archives-ouvertes.fr/hal-01727398
Contributor : Christine Leroux Connect in order to contact the contributor
Submitted on : Friday, March 9, 2018 - 10:40:01 AM
Last modification on : Thursday, August 4, 2022 - 5:05:49 PM

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UNIV-TLN | CNRS | UNIV-AMU | IM2NP | UNIV-COTEDAZUR | CRHEA

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M. Chmielowska, Sylvie Villain, A. Kopia, J. Dallas, J. Kusinski, et al.. Ce1−xNdxO2−δ/Si thin films obtained by pulsed laser deposition: Microstructure and conduction properties. Thin Solid Films, 2008, 516 (12), pp.3747 - 3754. ⟨10.1016/j.tsf.2007.06.224⟩. ⟨hal-01727398⟩

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